Choose from a range of evaporation sources including heated boats and filaments for low rate and thickness, to the latest version of powerful EBS electron beam gun series with up to 60 pockets in a single system for complex processes / extended running.  The EBS400 system using ESQ110A and 113A sources offers full longitudinal beam sweep remains and industry standard in many applications where high rate and thickness are the norm.  With full two dimensional beam sweep control, digital address of power distribution over the crucible area and the latest generation solid state power supply the EBS500 is most flexible electron beam tool available and can be configured for crucible quantity and size according to customer application.  

High stability “Effusion sources” are available for custom applications for coating materials with low vapour pressure or where special low rates are required in co- deposition applications.

Enhanced Evaporation

Evatec offers plasma sources which can be integrated in both new systems and as retrofit. The dedicated BAP801 for optical and optoelectronic applications uses reactive low voltage ion plating to enable deposition of extremely stable, complex thin film stacks

From “step coverage” to “lift off” processes, our  application engineers are available to assist you.