Evatec tools are configured for high precision thin film processing in wide ranging MEMS and NEMS applications including sensors, portable power generation,  displays and drug delivery.  Process know in collaboration with partner Corial SAS enables :

-  Control of film stress, breakdown voltages and stoichiometry using either PECVD or sputter processes. 

- Implementation of  ICP and RIE etch processes with high selectivity against mask materials, high aspect ratios and  tailored etch profiles. 

-"Low" and "damage free" plasma processes for sensitive sub layers

-Low temperature processing capability for "organics"

Choose from Corial Series  200 or 300   batch tools with or without load locks for single processes or configure a Radiance cluster tool with sputter, PECVD  and a selection of etch technologies available on just one  platform.  Contact your local Evatec office to custom build the right hardware and process solution.